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Home ꄲ Vacuum Equipment

Magnetron Sputtering Coating System

The experimental purpose of the DXMS-450C Magnetron Sputtering Coating System is to prepare thin films with nano and micro structures. Such as metal, semiconductor, dielectric, oxide, nitride and other nano films. The working mode of this system is single target independent operation, take turns working, and dual target co splashing.

넶5219 ¥ 0.00
Electron Beam Coating System

DXMC-500A Electron Beam Coating System mainly completes the coating of some metals, especially refractory metals and some oxide materials. It uses an electron beam deflection of 270º to heat and evaporate the materials, and is equipped with a glow discharge cleaning rod for plasma discharge cleaning.

넶4964 ¥ 0.00
Vacuum Annealing Furnace

Vacuum Annealing Furnace is suitable for heating and annealing soft magnetic materials in high temperature, high vacuum and strong magnetic field environments.

넶279 ¥ 0.00
Magnetron Sputtering System

DXT-450 Magnetron Sputtering System is applied for the preparation of a new type of thin-film material, including nanoscale monolayer and multilayer multifunctional film, hard film, metal film, semiconductor film, dielectric film and so on. It can be widely applied for thin-film material scientific research and small-batch preparation of universities and research institutions.

넶88 ¥ 0.00
Laser MBE System

DXLMBE-450 Laser Molecular Beam Epitaxy(MBE) System is for developing optical crystal, ferroelectric, ferromagnet, superconductor and organic compounds film material. It is especially for developing complicated stratiform superlattice thin film material with high melting point, multielement and containing gas elements. It can be widely applied for thin-film material scientific research and small-batch preparation of universities and research institutions.

넶40 ¥ 0.00
Vacuum Hot-press Sintering Furnace

The DXSF-1200 vacuum hot-press sintering furnace is a device that combines vacuum/atmosphere, hot-press molding, and high-temperature sintering. It is suitable for high-temperature thermoforming of new materials such as powder metallurgy and functional ceramics.

넶37 ¥ 0.00
Electric-Arc Furnace Equipment

DXD-500A Electric-Arc Furnace Equipment is applied for smelting high melting point metals or alloys, and prepares massive amorphous materials by adopting suction casting method/suction casting method. It is suitable for scientific research and small production of the vacuum of metallurgy new materials for colleges, scientific institutions and enterprises.

넶33 ¥ 0.00
Thin Film Solar Cell Continuous Preparation Equipment

Thin Film Solar Cell Continuous Preparation Equipment is applied for developing and small preparation of copper, indium, gallium, selenium, and solar cell.

넶32 ¥ 0.00
Thermal Evaporation Vacuum Coating Machine

DXD-450 Single Chamber Thermal Evaporation Vacuum Coating Machine is applied for the preparation of metal elementary substance film, semiconductor film, oxidized thin films, organic thin film, and so on. It can be used in research of new material, new technology films of scientific institutions. It could also used in test work before batch production.

넶31 ¥ 0.00
Vacuum Melt Spinning System

DX-II Vacuum Melt Spinning System is a special equipment for preparing, researching, and developing “metastable material”, such as new rare earth permanent magnetic materials, amorphous soft magnetic materials and nano-metric materials, etc.

넶29 ¥ 0.00
DXP-450B Laser Coating Equipment

DXP-450B Laser Coating Equipment is for preparing superconducting thin films, semiconductor films, ferroelectric films and so on. It is suitable for thin-film material scientific research and small-batch preparation of universities and research institutions.

넶28 ¥ 0.00
DXP-300 Laser Coating Equipment

DXP-300 Laser Coating Equipment is for preparing superconducting thin films, semiconductor films, ferroelectric films and so on. It is suitable for the thin-film material scientific research and small batch preparation of universities and research institutions.

넶28 ¥ 0.00
Silicon Carbide Crystal Growth Furnace

The silicon carbide crystal growth furnace adopts induction heating. In an inert gas (argon) environment, the silicon carbide powder in the graphite crucible is sublimated and deposited on the silicon carbide single crystal seed, that is, the physical vapor deposition method (PVD method) grows 6″ silicon carbide single crystals.

넶27 ¥ 0.00