High Vacuum Resistance Coating Equipment

Basic Structure and Main Technical Specifications of the Equipment

The coating equipment consists of a vacuum chamber, an evaporation source system, a sample stage system, a vacuum pump unit, an equipment frame, an electrical control system, and a glove box system. The front door of the vacuum chamber can be connected to the glove box. It adopts an integrated design scheme, and the whole set of equipment has a compact structure and simple layout, avoiding the phenomenon of messy appearance of experimental equipment.

1. Vacuum Chamber: 1 set

1. Exterior: One set of high-quality 304 stainless steel D-shaped front-opening vacuum chamber, internal dimensions φ550×H600mm. The door is a hinged square door for easy cleaning, adjustment, maintenance, and loading/unloading of items inside the vacuum chamber. The front door is a horizontal sliding square door. Each door is equipped with a DN100 viewing window. One set of inner lining plate is included.
2. Bottom: Four sets of metal source interfaces, two sets of American MCVAC water-cooled film thick probe interfaces. CF25 lighting interface (2 sets);
3. Top: Sample stage interface (1 set), pneumatic baffle interface (2 sets), GDQ-J16B-KF high vacuum pneumatic baffle valve interface (1 set);
4. Side wall: JTFB-1300Z water-cooled grease lubricating molecular pump interface (1 set), JCDQ-J40B-CF high vacuum pneumatic baffle valve interface (1 set), several reserved flanges;
5. Cavity leakage rate: Overall leakage rate better than 5×10-8 Pa.m3/S, pressure holding for 12 hours, pressure less than 10 Pa.
    

2. Evaporation source system: 1 set  

1. Four sets of metal sources: Four sets of water-cooled copper electrodes, compatible with evaporation boats (tungsten, molybdenum, tantalum boats) and spiral wires, capable of evaporating metals and oxides, etc., using cylinder baffles, flip-top switches, four DC power supplies, switchable, digital display. The evaporation power supplies can be controlled by software or manually. In addition, the evaporation power supplies can also automatically adjust the evaporation rate and control the evaporation accuracy (rate 0.1) through (closed-loop control);
2. Separators: The evaporation sources are separated by separators to avoid cross-contamination. Some separators can be disassembled without tools.

3. Sample Stage System: 1 set  

1. Substrate rotation: Utilizes a magnetic fluid seal to ensure reliable sealing; rotation speed is 5-20 rpm, continuously adjustable via touchscreen control.
2. Substrate lifting: The distance between the substrate and the evaporation source is 240-340mm; electric lifting is used, continuously adjustable via touchscreen control.
3. Substrate holder: A 200mm*200mm bracket can hold various sample/substrate sizes; equipped with a pneumatic baffle and rotation mechanism.
4. Sample: Heating and cooling.
5. Substrate baffle: Utilizes a magnetic fluid seal; it can be opened or closed at any angle of substrate rotation; controlled by software via a rotary switch, ensuring smooth speed.

4. Vacuum Pump Unit: 1 set  

1. One VRD-30 two-stage pump;
2. One DDC-JQ40-KF vacuum electromagnetic charging valve;
3. One set of KF40 pump-valve connecting hoses;
4. One GDQ-J40B-KF high-vacuum pneumatic baffle valve;
5. One JTFB-1300Z water-cooled grease-lubricated molecular pump;
6. One CCQ-200CF pneumatic ultra-high vacuum slide gate valve;
7. One CDQ-J40B-CF ultra-high vacuum pneumatic baffle valve;
8. One GDQ-J16B-KF high-vacuum pneumatic baffle valve;
9. One ZDF-5227 digital display vacuum gauge (measuring range: 1×10⁵～1×10⁻⁵ Pa).

5. Film Thickness Detection System: 1 set  

1. Film thickness gauge: One Incon SQC310C quartz crystal film thickness monitoring instrument is used. Mode: sequential coating; probe: two channels; display and control accuracy: 0.01 Å/s; frequency resolution: 0.01 Hz; with PID loop function, the film thickness gauge can automatically control the evaporation rate.
2. Film thickness probe: Two sets of imported MCVAC water-cooled film thickness probes from the USA, 6MHz, using a quick-release snap-fit structure to replace the crystal oscillator, avoiding damage to the crystal oscillator with a threaded clamping structure, and using a rubber ring locking and sealing structure.
    

6. System Frame

1. One set of 40 carbon steel square tube welded frame, powder coated;
2. Four 3-inch casters for movement and adjustment;
3. Four M16 feet for locking and positioning.

7. Other electrical control systems: 1 set (electrical control is built into the rack)

1. Baking lighting power supply: 1 unit;
2. Main control power supply: 1 unit, equipped with a computer touch screen, PLC controller, sample stage and baffle controller, evaporation source baffle controller, pump valve switches, phase sequence detection, and cable switch connectors, etc.
3. PC control
    

8. Other Parameter

1. Phase loss protection, misoperation protection, interlocking, and one-button vacuum start/stop functions;
2. Power supply: ~220V single-phase power supply system (peak 4KW);
3. Water supply: Circulating chiller, cooling water temperature 17℃～35℃, operating ambient temperature: 10℃～40℃;
4. Gas supply: Small oil-free silent air pump, providing 0.2-0.3MPa air pressure to drive pneumatic valves;
5. Ultimate vacuum: Better than 1×10-6 mbar, atmospheric pressure to 8×10-6 mbar in less than 40 minutes, filled with dry nitrogen.
6. Gas circuit: Three stainless steel pipelines.

9. Optional Component

1. Magnetron sputtering: A hybrid system for sputtering and evaporation
2. RF/DC bias: For substrate cleaning before deposition
3. Cryogenic pump station: For ultra-high vacuum (UHV) conditions
4. Vigor glove box - Dual station

Glove Box

• Housing: Stainless steel (US304; EU1.4301), 3mm thick, brushed surface, white paint finish.
• Removable Front Window: Safety glass, with a patented leak-free seal between the viewing window and the enclosure.
• Glove Jack: Anodized aluminum alloy, 8"/203mm, with a patented leak-free seal between the viewing window and glove opening.
• Glove: Butyl rubber, 200mm, length 810mm, ambidextrous glove.
• Bracket: The steel structure support is 900mm high and equipped with swivel casters.
• KF40 Flange： KF40, outside length 20mm, welded to the surface of the enclosure, including blind flanges
• Height-Adjustable Shelf: 800mm(W)X170mm(D), adjustable or fixed type
• One Pneumatic Cleaning Valve:DN25,external connection to KF40 (connected to the exhaust pipe)

Technical Parameter

• Leakage rate: <0.02 vol%/hr
• Technical specifications: Oxygen <1ppm, Water <1ppm
• Working gas: Nitrogen, argon or other special gases

Transition cabin

• One large transition chamber, made of stainless steel (US304; EU1.4301), 370X600mm, welded to the side of the enclosure, leak-proof, PLC-controlled automatic filling and emptying, and one sliding tray.

Gas purification system

• One gas purification column contains a copper catalyst and a molecular sieve.
• One organic solvent vapor adsorption column (Activated carbon)
• Fans, solenoid valves, and vacuum pumps (including oil mist filters)

Control System

• Power supply: Single-phase 220-230 VAC, 50Hz, 230 VA max
• One foot switch: Used for fine-tuning the tank pressure.
• Color touchscreen, 7-pin: Chinese or English
• One internal power cord with multi-hole socket
• PLC
• Automatic filling and emptying of the large transition chamber
• Circulation purification can be automatically controlled by the water and oxygen index within the chamber
• Fully integrated control of the heating transition chamber, refrigerator, and cooling system
• Automatic leakage rate detection
• Automatic control of chamber pressure, working pressure range: +10 to -10 mbar
• Automatic cleaning
• Display of operation errors and prompts
• Automatic recording and display of system historical data
• All operations have preset conditions and interlocking mechanisms

Detailed Information

• Model: LG2400/750TS
• Dimenion: 2* 1200m(L)*750mm(D)*900mm(H)
• Structure: Dual-sided
• Glove box quantity: 4
   

Configuration